Plasma diagnostics in reactive high-power impulse magnetron sputtering system working in Ar + H.sub.2./sub.S gas mixture

Hubička, Zdeněk; Čada, Martin; Kapran, Anna; Olejníček, Jiří; Kšírová, Petra; Zanáška, Michal; Adámek, Petr; Tichý, M.

doi:https://dx.doi.org/10.3390/coatings10030246

Number of the records: 1

Plasma diagnostics in reactive high-power impulse magnetron sputtering system working in Ar + H.sub.2./sub.S gas mixture

1.

SYSNO ASEP	0533973
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	Plasma diagnostics in reactive high-power impulse magnetron sputtering system working in Ar + H₂S gas mixture
Author(s)	Hubička, Zdeněk (FZU-D)_{RID, ORCID, SAI} Čada, Martin (FZU-D)_{RID, ORCID, SAI} Kapran, Anna (FZU-D)_ORCID Olejníček, Jiří (FZU-D)_{RID, ORCID} Kšírová, Petra (FZU-D)_{RID, ORCID} Zanáška, Michal (FZU-D)_ORCID Adámek, Petr (FZU-D)_{RID, ORCID} Tichý, M. (CZ)
Number of authors	8
Article number	246
Source Title	Coatings. - : MDPI Roč. 10, č. 3 (2020), s. 1-17
Number of pages	17 s.
Language	eng - English
Country	CH - Switzerland
Keywords	HiPIMS ; Langmuir probe ; optical emission spectrometry ; time-resolved probe measurements ; H₂S ; electron density ; electron temperature
Subject RIV	BL - Plasma and Gas Discharge Physics
OECD category	Coating and films
R&D Projects	EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	GA19-00579S GA ČR - Czech Science Foundation (CSF)
	FV20580 GA MPO - Ministry of Industry and Trade (MPO)
Method of publishing	Open access
Institutional support	FZU-D - RVO:68378271
UT WOS	000524211800051
EID SCOPUS	85083055184
DOI	10.3390/coatings10030246
Annotation	A reactive high-power impulse magnetron sputtering system (HiPIMS) working in Ar + H2S gas mixture was investigated as a source for the deposition of iron sulfide thin films. As a sputtering material, a pure Fe target was used. Plasma parameters in this system were investigated by a time-resolved Langmuir probe, radio-frequency (RF) ion flux probe, quartz crystal monitor modified for measurement of the ionized fraction of depositing particles, and by optical emission spectroscopy.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2021
Electronic address	http://hdl.handle.net/11104/0312196

Number of the records: 1