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Nanosphere lithography for structuring polycrystalline diamond films
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SYSNO ASEP 0533915 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Nanosphere lithography for structuring polycrystalline diamond films Author(s) Domonkos, Mária (FZU-D) RID
Demo, Pavel (FZU-D) RID, SAI, ORCID
Kromka, Alexander (FZU-D) RID, ORCID, SAINumber of authors 3 Article number 118 Source Title Crystals. - : MDPI - ISSN 2073-4352
Roč. 10, č. 2 (2020), s. 1-14Number of pages 14 s. Language eng - English Country CH - Switzerland Keywords diamond thin films ; nanosphere lithography ; polystyrene spheres ; reactive ion etching Subject RIV BH - Optics, Masers, Lasers OECD category Optics (including laser optics and quantum optics) R&D Projects EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) LM2018110 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Method of publishing Open access Institutional support FZU-D - RVO:68378271 UT WOS 000519704700064 EID SCOPUS 85079621924 DOI https://doi.org/10.3390/cryst10020118 Annotation This paper deals with the structuring of polycrystalline diamond thin films using the technique of nanosphere lithography. The presented multistep approaches relied on a spin-coated self-assembled monolayer of polystyrene spheres, which served as a lithographic mask for the further custom nanofabrication steps. The size and shape of the lithographic mask was altered using oxygen plasma etching. The periodicity of the final structure was defined by the initial diameter of the spheres. The advantages and limitations of the fabrication technique are discussed. Finally, the potential applications (e.g., photonics, plasmonics) of the obtained nanostructures are reviewed.
Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2021 Electronic address http://hdl.handle.net/11104/0312141
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