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Rippled Metallic-Nanowire/Graphene/Semiconductor Nanostack for a Gate-Tunable Ultrahigh-Performance Stretchable Phototransistor

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    SYSNO ASEP0533057
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleRippled Metallic-Nanowire/Graphene/Semiconductor Nanostack for a Gate-Tunable Ultrahigh-Performance Stretchable Phototransistor
    Author(s) Haider, Golam (UFCH-W) ORCID, RID
    Wang, Y. H. (CN)
    Farjana, Jaishmin Sonia (UFCH-W) ORCID, RID
    Chiang, Ch.-W. (CN)
    Frank, Otakar (UFCH-W) RID, ORCID
    Vejpravová, J. (CZ)
    Kalbáč, Martin (UFCH-W) RID, ORCID
    Chen, Y.-F. (CN)
    Article number2000859
    Source TitleAdvanced Optical Materials. - : Wiley - ISSN 2195-1071
    Roč. 8, č. 19 (2020)
    Number of pages10 s.
    Languageeng - English
    CountryDE - Germany
    Keywordszinc-oxide nanostructures ; hybrid graphene ; strain sensors ; electronics ; photodetectors ; responsivity ; transistors ; skin ; mechanics ; pressure ; gate-tunable phototransistor ; single-layer graphene ; stretchable phototransistor ; ultrahigh responsivity ; ZnO nanoparticles
    Subject RIVCF - Physical ; Theoretical Chemistry
    OECD categoryPhysical chemistry
    R&D ProjectsGX20-08633X GA ČR - Czech Science Foundation (CSF)
    EF16_027/0008355 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    LTAUSA19001 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    EF16_026/0008382 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Method of publishingLimited access
    Institutional supportUFCH-W - RVO:61388955
    UT WOS000550679500001
    EID SCOPUS85088297638
    DOI10.1002/adom.202000859
    AnnotationDespite being one of the most robust materials with intriguing optoelectronic properties, the practical use of single-layer graphene (SLG) in soft-electronic technologies is limited due to its poor native stretchability, low absorption coefficient, poor on/off ratio, etc. To circumvent these difficulties, here, a rippled gate-tunable ultrahigh responsivity nanostack phototransistor composed of SLG, semiconductor-nanoparticles (NPs), and metallic-nanowires (NWs) embedded in an elastic film is proposed. The unique electronic conductivity of SLG and high absorption strength of semiconductor-NPs produce an ultrahigh photocurrent gain. The metallic NWs serve as an excellent stretchable gate electrode. The ripple structured nanomaterials surmount their native stretchability, providing strength and electromechanical stability to the composite. Combining all these unique features, highly stretchable and ultrasensitive phototransistors are created, which can be stretched up to 30% with high repeatability maintaining a photoresponsivity, photocurrent gain, and detectivity of approximate to 10(6)A W-1, 10(7), and 10(13)Jones, respectively, which are comparable with the same class of rigid devices. In addition, the device can be turned-off by applying a suitable gate voltage, which is very convenient for photonic circuits. Moreover, the study can be extended to many other 2D systems, and therefore paves a crucial step for designing high-performance soft optoelectronic devices for practical applications.
    WorkplaceJ. Heyrovsky Institute of Physical Chemistry
    ContactMichaela Knapová, michaela.knapova@jh-inst.cas.cz, Tel.: 266 053 196
    Year of Publishing2021
    Electronic addresshttp://hdl.handle.net/11104/0311556
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