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Transferless Inverted graphene/silicon heterostructures prepared by plasma-enhanced chemical vapor deposition of amorphous silicon on CVD graphene
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SYSNO 0531897 Title Transferless Inverted graphene/silicon heterostructures prepared by plasma-enhanced chemical vapor deposition of amorphous silicon on CVD graphene Author(s) Müller, Martin (FZU-D) RID, ORCID
Bouša, Milan (UFCH-W) RID, ORCID
Hájková, Zdeňka (FZU-D) RID, ORCID
Ledinský, Martin (FZU-D) RID, ORCID, SAI
Fejfar, Antonín (FZU-D) RID, ORCID, SAI
Drogowska-Horna, Karolina A. (UFCH-W)
Kalbáč, Martin (UFCH-W) RID, ORCID
Frank, Otakar (UFCH-W) RID, ORCIDCorespondence/senior Frank, Otakar - Korespondující autor Source Title Nanomaterials. Roč. 10, č. 3 (2020), s. 1-10. - : MDPI Article number 589 Document Type Článek v odborném periodiku Grant CZ.02.1.01/0.0/0.0/16_026/0008382 EF16_026/0008382 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GA17-18702S GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic EF16_013/0001821 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic LM2018110 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support FZU-D - RVO:68378271 ; UFCH-W - RVO:61388955 Language eng Country CH Keywords silicon * graphene * heterostructure * CDV URL http://hdl.handle.net/11104/0310529 Permanent Link http://hdl.handle.net/11104/0310529 File Download Size Commentary Version Access 0531897.pdf 1 1.9 MB CC licence Publisher’s postprint open-access
Number of the records: 1