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Ion sputtering for preparation of thin MAX and MXene phases
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SYSNO 0523928 Title Ion sputtering for preparation of thin MAX and MXene phases Author(s) Vacík, Jiří (UJF-V) [ONF] RID, ORCID, SAI
Horák, Pavel (UJF-V) [ONF] RID, ORCID
Bakardjieva, Snejana (UACH-T) [CIT] SAI, RID, ORCID
Bejšovec, Václav (UJF-V) [ONF] RID
Ceccio, Giovanni (UJF-V) [ONF] ORCID, RID, SAI
Cannavó, Antonino (UJF-V) [ONF] ORCID, SAI
Torrisi, Alfio (UJF-V) [ONF] RID, ORCID
Lavrentiev, Vasyl (UJF-V) [ONF] RID, ORCID, SAI
Klie, R. (US)Corespondence/senior Vacík, Jiří - Korespondující autor Source Title Radiation Effects and Defects in Solids. Roč. 175, 1-2 (2020), s. 177-189. - : Taylor & Francis Document Type Článek v odborném periodiku Grant GA18-21677S GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic Institutional support UJF-V - RVO:61389005 ; UACH-T - RVO:61388980 Language eng Country GB Keywords ion beam sputtering * low energy ion facility * thin films * MAX and MXenes phases URL https://doi.org/10.1080/10420150.2020.1718142 Permanent Link http://hdl.handle.net/11104/0308218
Number of the records: 1