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The effect of magnetic field strength and geometry on the deposition rate and ionized flux fraction in the HiPIMS discharge

  1. 1.
    SYSNO0519372
    TitleThe effect of magnetic field strength and geometry on the deposition rate and ionized flux fraction in the HiPIMS discharge
    Author(s) Hajihoseini, H. (IS)
    Čada, Martin (FZU-D) RID, ORCID, SAI
    Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
    Ünaldi, S. (FR)
    Raadu, M.A. (SE)
    Brenning, N. (FR)
    Gudmundsson, J.T. (IS)
    Lundin, D. (FR)
    Source Title Plasma. Roč. 2, č. 2 (2019), s. 201-221. - : MDPI
    Document TypeČlánek v odborném periodiku
    Grant CZ.02.1.01/0.0/0.0/16_019/0000760, XE - EU countries
    EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic
    GA19-00579S GA ČR - Czech Science Foundation (CSF)
    Institutional supportFZU-D - RVO:68378271
    Languageeng
    CountryCH
    Keywords ionized physical vapor deposition * magnetron sputtering * high power impulse magnetron sputtering (HiPIMS) * ionized flux fraction * deposition rate
    URLhttp://hdl.handle.net/11104/0304364
    Permanent Linkhttp://hdl.handle.net/11104/0304364
    FileDownloadSizeCommentaryVersionAccess
    0519372.pdf01.2 MBCC licencePublisher’s postprintopen-access
     
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