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The effect of magnetic field strength and geometry on the deposition rate and ionized flux fraction in the HiPIMS discharge
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SYSNO ASEP 0519372 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Ostatní články Title The effect of magnetic field strength and geometry on the deposition rate and ionized flux fraction in the HiPIMS discharge Author(s) Hajihoseini, H. (IS)
Čada, Martin (FZU-D) RID, ORCID, SAI
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Ünaldi, S. (FR)
Raadu, M.A. (SE)
Brenning, N. (FR)
Gudmundsson, J.T. (IS)
Lundin, D. (FR)Number of authors 8 Source Title Plasma. - : MDPI
Roč. 2, č. 2 (2019), s. 201-221Number of pages 21 s. Language eng - English Country CH - Switzerland Keywords ionized physical vapor deposition ; magnetron sputtering ; high power impulse magnetron sputtering (HiPIMS) ; ionized flux fraction ; deposition rate Subject RIV BL - Plasma and Gas Discharge Physics OECD category Fluids and plasma physics (including surface physics) R&D Projects EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GA19-00579S GA ČR - Czech Science Foundation (CSF) Method of publishing Open access Institutional support FZU-D - RVO:68378271 DOI 10.3390/plasma2020015 Annotation We explored the effect of magnetic field strength B and geometry (degree of balancing) on the deposition rate and ionized flux fraction Fflux in dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS) when depositing titanium. The HiPIMS discharge was run in two different operating modes. The first one we refer to as “fixed voltage mode” where the cathode voltage was kept fixed at 625 V while the pulse repetition frequency was varied to achieve the desired time average power (300 W). The second mode we refer to as “fixed peak current mode” and was carried out by adjusting the cathode voltage to maintain a fixed peak discharge current and by varying the frequency to achieve the same average power. Our results show that the dcMS deposition rate was weakly sensitive to variations in the magnetic field while the deposition rate during HiPIMS operated in fixed voltage mode changed from 30% to 90% of the dcMS deposition rate as B decreased. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2020 Electronic address http://hdl.handle.net/11104/0304364
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