The effect of magnetic field strength and geometry on the deposition rate and ionized flux fraction in the HiPIMS discharge

0519372 - FZÚ 2020 RIV CH eng J - Journal Article
Hajihoseini, H. - Čada, Martin - Hubička, Zdeněk - Ünaldi, S. - Raadu, M.A. - Brenning, N. - Gudmundsson, J.T. - Lundin, D.
The effect of magnetic field strength and geometry on the deposition rate and ionized flux fraction in the HiPIMS discharge.
Plasma. Roč. 2, č. 2 (2019), s. 201-221. E-ISSN 2571-6182
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR GA19-00579S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : ionized physical vapor deposition * magnetron sputtering * high power impulse magnetron sputtering (HiPIMS) * ionized flux fraction * deposition rate
OECD category: Fluids and plasma physics (including surface physics)
Method of publishing: Open access

Permanent Link: http://hdl.handle.net/11104/0304364