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Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
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SYSNO ASEP 0512095 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering Author(s) Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Zlámal, M. (CZ)
Čada, Martin (FZU-D) RID, ORCID, SAI
Kment, Štěpán (FZU-D) RID, ORCID
Krysa, J. (CZ)Number of authors 5 Source Title Catalysis Today. - : Elsevier - ISSN 0920-5861
Roč. 328, May (2019), s. 29-34Number of pages 6 s. Language eng - English Country NL - Netherlands Keywords high power impulse magnetron sputtering ; reactive sputtering ; magnetron discharge ; photocathode ; photocurrent ; copper oxide Subject RIV BM - Solid Matter Physics ; Magnetism OECD category Condensed matter physics (including formerly solid state physics, supercond.) R&D Projects GA17-20008S GA ČR - Czech Science Foundation (CSF) EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Method of publishing Limited access Institutional support FZU-D - RVO:68378271 UT WOS 000461462200006 EID SCOPUS 85057216402 DOI https://doi.org/10.1016/j.cattod.2018.11.034 Annotation Copper oxide thin films were deposited by a reactive high power impulse magnetron sputtering (r-HIPIMS) on glass substrates with a SnO2:F (FTO) layer. The pulse magnetron discharge was analyzed via the radio frequency (RF) Sobolewski probe, used for the time-resolved measurement of ion flux density on the substrate. Pulsed discharge current and voltage waveforms were analyzed.
Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2020 Electronic address https://doi.org/10.1016/j.cattod.2018.11.034
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