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Photo-electrochemical properties of WO.sub.3./sub. and alpha-Fe.sub.2./sub.O.sub.3./sub. thin films

  1. 1.
    SYSNO0510813
    TitlePhoto-electrochemical properties of WO3 and alpha-Fe2O3 thin films
    Author(s) Krysa, J. (CZ)
    Zlámal, M. (CZ)
    Kment, Štěpán (FZU-D) RID, ORCID
    Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
    Source Title Chemical Engineering Transactions. Roč. 41, SI (2014), s. 379-384
    Edition Chemical Engineering Transactions
    Document TypeČlánek v odborném periodiku
    Grant GAP108/12/2104 GA ČR - Czech Science Foundation (CSF)
    Institutional supportFZU-D - RVO:68378271
    Languageeng
    CountryIT
    Keywords sputtering * HiPIMS * thin films
    URLhttp://hdl.handle.net/11104/0301192
    Permanent Linkhttp://hdl.handle.net/11104/0301192
    FileDownloadSizeCommentaryVersionAccess
    0510813.pdf1821.7 KBOAPublisher’s postprintopen-access
     
Number of the records: 1  

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