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Photo-electrochemical properties of WO.sub.3./sub. and alpha-Fe.sub.2./sub.O.sub.3./sub. thin films
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SYSNO ASEP 0510813 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Photo-electrochemical properties of WO3 and alpha-Fe2O3 thin films Author(s) Krysa, J. (CZ)
Zlámal, M. (CZ)
Kment, Štěpán (FZU-D) RID, ORCID
Hubička, Zdeněk (FZU-D) RID, ORCID, SAINumber of authors 4 Source Title Chemical Engineering Transactions - ISSN 1974-9791
Roč. 41, SI (2014), s. 379-384Series Chemical Engineering Transactions Number of pages 6 s. Language eng - English Country IT - Italy Keywords sputtering ; HiPIMS ; thin films Subject RIV BL - Plasma and Gas Discharge Physics OECD category Fluids and plasma physics (including surface physics) R&D Projects GAP108/12/2104 GA ČR - Czech Science Foundation (CSF) Method of publishing Open access Institutional support FZU-D - RVO:68378271 UT WOS 000346539800064 EID SCOPUS 84908658681 DOI 10.3303/CET1441064 Annotation Iron oxide (α-Fe2O3) in hematite crystalline structure and tungsten trioxide have recently attracted much attention as possibly convenient materials to be used for hydrogen production via photoelectrochemical water splitting. Thius is due to their favorable properties such as band gaps between 2.0 - 2.2 eV (α-Fe2O3) and 2.5–2.8 eV (WO3) which allows absorbing of a substantial fraction of solar spectrum. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2020 Electronic address http://hdl.handle.net/11104/0301192
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