Photo-electrochemical properties of WO.sub.3./sub. and alpha-Fe.sub.2./sub.O.sub.3./sub. thin films

0510813 - FZÚ 2020 RIV IT eng J - Journal Article
Krysa, J. - Zlámal, M. - Kment, Štěpán - Hubička, Zdeněk
Photo-electrochemical properties of WO₃ and alpha-Fe₂O₃ thin films.
Chemical Engineering Transactions. Chemical Engineering Transactions. Roč. 41, SI (2014), s. 379-384. ISSN 1974-9791
R&D Projects: GA ČR GAP108/12/2104
Institutional support: RVO:68378271
Keywords : sputtering * HiPIMS * thin films
OECD category: Fluids and plasma physics (including surface physics)
Method of publishing: Open access

Permanent Link: http://hdl.handle.net/11104/0301192