Cadmium Assisted Photochemical Vapor Generation of Tungsten for Detection by Inductively Coupled Plasma Mass Spectrometry

0509645 - ÚIACH 2020 RIV US eng J - Journal Article
Vyhnanovský, Jaromír - Sturgeon, R. E. - Musil, Stanislav
Cadmium Assisted Photochemical Vapor Generation of Tungsten for Detection by Inductively Coupled Plasma Mass Spectrometry.
Analytical Chemistry. Roč. 91, č. 20 (2019), s. 13306-13312. ISSN 0003-2700. E-ISSN 1520-6882
R&D Projects: GA ČR(CZ) GJ19-17604Y
Institutional support: RVO:68081715
Keywords : photochemical vapor generation * ICPMS * tungsten
OECD category: Analytical chemistry
Impact factor: 6.785, year: 2019
Method of publishing: Limited access

Efficient photochemical vapor generation (PVG) of tungsten has been achieved for the first time using a 19 W thin film flow-through photoreactor. The volatile
product (most probably tungsten hexacarbonyl) was generated using a flow injection mode and 40% (v/v) formic acid as the reaction medium. An inductively coupled plasma mass
spectrometer was utilized for ultrasensitive detection. The addition of Cd2+ as a sensitizer was critical, enhancing the overall PVG efficiency some 30 000-fold. At an optimal
irradiation time of 19 s, a 6.1-fold enhancement factor and an overall PVG efficiency of 43% were determined from a comparison of the response to direct solution nebulization
when using a sample flow rate of 2 mL min−1 and 500 mg L−1 Cd2+ as a sensitizer. A limit of detection of 0.9 ng L−1 and repeatability (RSD) of 2% at 100 ng L−1 were achieved. Interference
from inorganic acids (HNO3, HCl, H2SO4, and HF) was investigated with respect to analytical application to real samples. The accuracy and practical feasibility of this ultrasensitive methodology was successfully verified by analysis of Certified Reference
Material CTA-FFA-1 (Fine Fly Ash) and six natural water samples with low W concentrations.
Permanent Link: http://hdl.handle.net/11104/0300320