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Oxidation of ablated silicon during pulsed laser deposition in a background gas with different oxygen partial pressures
- 1.Starinskiy, S.V., Rodionov, A.A., Shukhov, Y.G., Bulgakov, A. V. Oxidation of ablated silicon during pulsed laser deposition in a background gas with different oxygen partial pressures. In: MARKOVICH, D.M., KUIBIN, P.A., VOROBYEV, M.A., eds. EPJ Web of Conferences. Vol. 196. les Ulis: EDP Sciences, 2019, s. 1-5, č. článku 00008. ISSN 2100-014X. Available: https://doi.org/10.1051/epjconf/201919600008.
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