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Plasmon Catalysis on Bimetallic Surface-Selective Hydrogenationof Alkynes to Alkanes or Alkenes.
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SYSNO ASEP 0507031 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Plasmon Catalysis on Bimetallic Surface-Selective Hydrogenationof Alkynes to Alkanes or Alkenes. Author(s) Guselnikova, O. (CZ)
Olshtrem, A. (CZ)
Kalachyova, Y. (CZ)
Panov, Illia (UCHP-M) RID, ORCID, SAI
Postnikov, P. (CZ)
Švorčík, V. (CZ)
Lyutakov, O. (CZ)Source Title Journal of Physical Chemistry C. - : American Chemical Society - ISSN 1932-7447
Roč. 122, č. 46 (2018), s. 26613-26622Number of pages 10 s. Language eng - English Country US - United States Keywords wisible-light photocatalysis ; single-particle ; hot-electrons Subject RIV CC - Organic Chemistry OECD category Organic chemistry Method of publishing Limited access Institutional support UCHP-M - RVO:67985858 UT WOS 000451495600036 EID SCOPUS 85055495708 DOI 10.1021/acs.jpcc.8b07398 Annotation Utilization of plasmonics as a driving tool for chemical transformation triggering enables to achieve unprecedented results regarding photochemical conversion efficiency and chemical selectivity regulation. In this study, the bimetallic surface plasmon-polariton-supported grating is proposed as an effective background for plasmon-induced hydrogenation of alkynyl groups of absolute chemoselectivity. The periodical bimetallic structure consists of spatially modulated gold layers, covered with the nanometer-thick platinum layer. The alkyne bonds are covalently attached to the surface of the catalytic system through covalent grafting of the bimetallic surface with 4-ethynylbenzenediazonium tosylate, with triple bonds separated from the platinum layer by the benzene rings. The proposed bimetallic structure enables selective hydrogenation of alkyne bonds to alkenyl or alkyl moieties using cyclohexene as a hydrogen source. The selectivity of hydrogenation can be controlled by changing the structure parameters, for example, the thickness of the upper platinum layer. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2020 Electronic address http://hdl.handle.net/11104/0298123
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