Number of the records: 1
Enhanced diamond nucleation via photoresist polymers combined with nanodiamond seeding layers
- 1.
SYSNO ASEP 0496872 Document Type A - Abstract R&D Document Type The record was not marked in the RIV R&D Document Type Není vybrán druh dokumentu Title Enhanced diamond nucleation via photoresist polymers combined with nanodiamond seeding layers Author(s) Szabó, Ondrej (FZU-D) ORCID, RID
Ižák, Tibor (FZU-D) RID
Potocký, Štěpán (FZU-D) RID, ORCID
Kromka, Alexander (FZU-D) RID, ORCID, SAINumber of authors 4 Source Title NANOCON 2017 - Book of Abstracts. - Ostrava : Tanger Ltd, 2017 / Shrbená J. - ISBN 978-80-87294-78-9
S. 89-90Number of pages 2 s. Action NANOCON 2017. International Conference on Nanomaterials - Research & Application /9./ Event date 18.10.2017 - 20.10.2017 VEvent location Brno Country CZ - Czech Republic Event type WRD Language eng - English Country CZ - Czech Republic Keywords diamond film ; nucleation ; polymers ; Raman ; SEM Subject RIV BM - Solid Matter Physics ; Magnetism OECD category Condensed matter physics (including formerly solid state physics, supercond.) R&D Projects GA17-19968S GA ČR - Czech Science Foundation (CSF) 7AMB17AT036 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support FZU-D - RVO:68378271 Annotation Here we studied the influence of two different photoresist polymers (S1802 and ma1215 spin-coated at thicknesses 100 nm and 1.5 m, respectively) and their multi-layered combinations with nanodiamond seeding layer(s) on the nucleation and growth of diamond thin films. Before the diamond CVD growth the atomically flat (100) silicon substrates were treated in different ways employing i) only nanodiamond seeding layer (NL), ii) only photoresist layer (PL), iii) nanodiamond/photoresist layer (NL/PL) and other layer combinations: iv) PL/NL, v) NL/PL/NL, vi) PL/NL/PL. All the samples were loaded to the microwave CVD system to grow the diamond thin films at low temperature (300 °C) in H2/CH4/CO2 gas mixture for 3 and 9 hours. The film morphology and its quality were evaluated by scanning electron microscopy and Raman measurements. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2019
Number of the records: 1