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Anodic Deposition of Enantiopure Hexahelicene Layers.
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SYSNO ASEP 0496651 Document Type C - Proceedings Paper (int. conf.) R&D Document Type The record was not marked in the RIV Title Anodic Deposition of Enantiopure Hexahelicene Layers. Author(s) Vacek, J. (CZ)
Hrbáč, J. (CZ)
Strašák, Tomáš (UCHP-M) RID, ORCID, SAI
Církva, Vladimír (UCHP-M) RID, ORCID, SAI
Sýkora, Jan (UCHP-M) RID, ORCID, SAI
Crassous, J. (FR)
Žádný, Jaroslav (UCHP-M) RID, SAI, ORCID
Storch, Jan (UCHP-M) RID, ORCID, SAISource Title Book of Abstracts. - Louvain-la-Neuve : Université catholique de Louvain, 2018 / Gaigneux E. - ISBN N Pages s. 122 Number of pages 1 s. Publication form Print - P Action International Symposium on Flexible Organic Electronics (ISFOE18) /11./ Event date 02.07.2018 - 05.07.2018 VEvent location Thessaloniki Country GR - Greece Event type WRD Language eng - English Country GR - Greece Keywords helicenes ; chiral ; electrochemistry Subject RIV CC - Organic Chemistry OECD category Organic chemistry R&D Projects GA17-02578S GA ČR - Czech Science Foundation (CSF) FV10082 GA MPO - Ministry of Industry and Trade (MPO) Institutional support UCHP-M - RVO:67985858 Annotation Helicenes are polyaromatic compounds with chiral properties useful for many applications in optoelectronics, separation processes, chiral recognition and catalysis. Here we focused on the electrochemistry of carbo[n]helicenes (n=5,6,7) with emphasis on the formation of deposited structures (layers) onto the electrode surface. The helicenes were electrodeposited onto transparent indium tin oxide (ITO) electrodes and characterized by atomic force microscopy, UV/Vis, Raman spectroscopy and ellipsometry. Finally, the anodic deposition of P and M enantiomers of [6]helicene was performed using ITO substrates, resulting in the formation of enantiopure layers of nanometer thicknesses as confirmed by circular dichroism spectroscopy. The discovered electrosynthetic procedure opens up a new possibility for the immobilization of chiral helicene layers onto solid supports. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2019
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