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Magnetron sputtered Hf-B-Si-C-N films with controlled electrical conductivity and optical transparency, and with ultrahigh oxidation resistance

  1. 1.
    SYSNO0489160
    TitleMagnetron sputtered Hf-B-Si-C-N films with controlled electrical conductivity and optical transparency, and with ultrahigh oxidation resistance
    Author(s) Šímová, V. (CZ)
    Vlček, J. (CZ)
    Zuzjaková, Š. (CZ)
    Houška, J. (CZ)
    Shen, Y. (US)
    Jiang, J. C. (US)
    Meletis, E. I. (US)
    Peřina, Vratislav (UJF-V) [ONF] RID
    Source Title Thin Solid Films. Roč. 653, č. 5 (2018), s. 333-340. - : Elsevier
    Document TypeČlánek v odborném periodiku
    Grant LM2015056 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Institutional supportUJF-V - RVO:61389005
    Languageeng
    CountryCH
    Keywords Hf-B-Si-C-N films * pulsed reactive magnetron sputtering * electrical conductivitiy * optical transparency * high-temperature oxidation resistance
    Cooperating institutions Západočeská univerzita v Plzni (Czech Republic)
    Permanent Linkhttp://hdl.handle.net/11104/0283663
     
Number of the records: 1  

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