Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO.sub.2./sub. layers

Number of the records: 1

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SYSNO	0486979
Title	Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO₂ layers
Author(s)	Hippler, R. (DE) Hubička, Zdeněk (FZU-D)_{RID, ORCID, SAI} Čada, Martin (FZU-D)_{RID, ORCID, SAI} Kšírová, Petra (FZU-D)_{RID, ORCID} Wulff, H. (DE) Helm, C.A. (DE) Straňák, V. (CZ)
Source Title	Journal of Applied Physics. Roč. 121, č. 17 (2017), s. 1-9. - : AIP Publishing
Article number	171906
Document Type	Článek v odborném periodiku
Grant	GA15-00863S GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic
Institutional support	FZU-D - RVO:68378271
Language	eng
Country	US
Keywords	HiPIMS * Langmuir probe * titanium dioxide * angular dependence * XRD * SEM
Permanent Link	http://hdl.handle.net/11104/0281685

Number of the records: 1