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Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering
- 1.0470666 - FZÚ 2017 RIV US eng J - Journal Article
Lundin, D. - Čada, Martin - Hubička, Zdeněk
Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering.
Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 34, č. 4 (2016), 1-10, č. článku 041305. ISSN 0734-2101. E-ISSN 1520-8559
R&D Projects: GA ČR(CZ) GA15-00863S
EU Projects: European Commission(XE) 608800 - HIPPOCAMP
Institutional support: RVO:68378271
Keywords : radiofrequency current * voltage measurements * energy-distributions * sheath voltages * deposition * density * hysteresis * discharges * films * technology
Subject RIV: BL - Plasma and Gas Discharge Physics
Impact factor: 1.374, year: 2016
A new planar ion flux probe, based on the Sobolewski method for time-resolved plasma characterization in inherently noisy pulsed plasma discharges, has been developed. The probe was evaluated in a high-power impulse magnetron sputtering (HiPIMS) process, which is a promising ionized physical vapor deposition technique based on pulsed plasma discharges used to engineer thin films with improved properties. Both nonreactive (pure Ar) and reactive (Ar/O-2) deposition processes were investigated using a Ti sputtering target. It was found that the process exhibited a nearly hysteresis-free and stable transition region at the chosen deposition conditions. Time-resolved measurements of the absolute ion flux impinging on the probe placed at the substrate position, as well as of the probe sheath impedance, were recorded in the metal, transition, and compound modes during the HiPIMS pulse. Gradual changes in the measured ion flux were seen when transiting from the metal mode to the compound mode.
Permanent Link: http://hdl.handle.net/11104/0268241
Number of the records: 1