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Characterization of thin MnSi and MnGe Layers Prepared by Reactive UV Pulsed Laser Deposition.
- 1.0465309 - ÚCHP 2017 RIV CH eng J - Journal Article
Koštejn, Martin - Fajgar, Radek - Dytrych, Pavel - Kupčík, Jaroslav - Dřínek, Vladislav - Jandová, Věra - Huber, Š. - Novotný, F.
Characterization of thin MnSi and MnGe Layers Prepared by Reactive UV Pulsed Laser Deposition.
Thin Solid Films. Roč. 619, NOV 30 (2016), s. 73-80. ISSN 0040-6090. E-ISSN 1879-2731
R&D Projects: GA ČR GC15-08842J
Institutional support: RVO:67985858
Keywords : diluted ferromagnetic semiconductor * reactive pulsed laser deposition * silicide
Subject RIV: CF - Physical ; Theoretical Chemistry
Impact factor: 1.879, year: 2016 ; AIS: 0.384, rok: 2016
DOI: https://doi.org/10.1016/j.tsf.2016.10.035
Permanent Link: http://hdl.handle.net/11104/0266707File Download Size Commentary Version Access 0465309.pdf 2 2 MB Publisher’s postprint open-access
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