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Ion-implantation of erbium to the nanocrystalline diamond thin films
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SYSNO ASEP 0465018 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Ion-implantation of erbium to the nanocrystalline diamond thin films Author(s) Nekvindová, P. (CZ)
Babchenko, Oleg (FZU-D) RID, ORCID
Cajzl, J. (CZ)
Kromka, Alexander (FZU-D) RID, ORCID, SAI
Macková, Anna (UJF-V) RID, ORCID, SAI
Malinský, Petr (UJF-V) RID, ORCID, SAI
Oswald, Jiří (FZU-D) RID, ORCID
Prajzler, Václav (FZU-D) RID
Remeš, Zdeněk (FZU-D) RID, ORCID
Varga, Marián (FZU-D) RID, ORCIDSource Title Journal of Optoelectronics and Advanced Materials. - : NATL INST OPTOELECTRONICS - ISSN 1454-4164
Roč. 18, 7-8 (2016), s. 679-684Number of pages 6 s. Language eng - English Country RO - Romania Keywords nanocrystalline diamond ; optical waveguides ; erbium ; luminescence ; ion implantation ; CVD Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects GA14-05053S GA ČR - Czech Science Foundation (CSF) LM2011019 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support FZU-D - RVO:68378271 ; UJF-V - RVO:61389005 UT WOS 000383819800014 EID SCOPUS 84994501816 Annotation High-refractive-index nanocrystalline diamond films deposited on borosilicate glass from a CH4/CO2/H2 gas mixture by a linear-antenna microwave plasma-enhanced chemical vapour deposition (MW PECVD) were doped by erbium using ion- implantation technique. The prepared thin films guided an optical signal in the range of 632–1552 nm and revealed measurable luminescence around 1530 nm. The changes of optical properties and surface morphology were studied more
in detail.Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2017
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