Number of the records: 1  

Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber

  1. 1.
    SYSNO ASEP0449004
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleContamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber
    Author(s) Pokorný, Petr (FZU-D) RID, ORCID, SAI
    Musil, Jindřich (FZU-D) RID, ORCID
    Fitl, Přemysl (FZU-D) RID, ORCID
    Novotný, Michal (FZU-D) RID, ORCID, SAI
    Lančok, Ján (FZU-D) RID, ORCID
    Bulíř, Jiří (FZU-D) RID, ORCID, SAI
    Source TitlePlasma Processes and Polymers. - : Wiley - ISSN 1612-8850
    Roč. 12, č. 5 (2015), s. 416-421
    Number of pages6 s.
    Languageeng - English
    CountryDE - Germany
    Keywordscontamination ; low-pressure discharges ; magnetron ; metallic films ; sputtering
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsGAP108/11/1298 GA ČR - Czech Science Foundation (CSF)
    GAP108/11/1312 GA ČR - Czech Science Foundation (CSF)
    GAP108/11/0958 GA ČR - Czech Science Foundation (CSF)
    GA14-10279S GA ČR - Czech Science Foundation (CSF)
    Institutional supportFZU-D - RVO:68378271
    UT WOS000354622600002
    EID SCOPUS84929512249
    DOI10.1002/ppap.201400172
    AnnotationThe article reports on the contamination of Ag thin films sputtered from a pure Ag target in Ar and Ne gas by the RF magnetron by gas atoms contained in residual gas atmosphere in the deposition chamber at different values of the base pressure. The amount of O atoms generated at different values of base pressure is compared with the amount of Ag atoms sputtered at different deposition rates of Ag film. This comparison reveals a great problem in the formation of pure metallic films at low deposition rates and high values of the base pressure. No pure Ag films can be deposited at low in deposition chambers evacuated with diffusion or root pumps to the base pressures lower than 1mPa only.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2016
Number of the records: 1  

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