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Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber
- 1.POKORNÝ, Petr, MUSIL, Jindřich, FITL, Přemysl, NOVOTNÝ, Michal, LANČOK, Ján, BULÍŘ, Jiří. Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber. Plasma Processes and Polymers. 2015, 12(5), 416-421. ISSN 1612-8850. E-ISSN 1612-8869. Available: doi: 10.1002/ppap.201400172
Number of the records: 1