Effect of air annealing on mechanical properties and structure of SiC.sub.x./sub.N.sub.y./sub. magnetron sputtered films

0427277 - FZÚ 2015 RIV CH eng J - Journal Article
Kulikovsky, V. - Čtvrtlík, Radim - Vorlíček, Vladimír - Železný, Vladimír - Boháč, Petr - Jastrabík, L.
Effect of air annealing on mechanical properties and structure of SiC_xN_y magnetron sputtered films.
Surface and Coatings Technology. Roč. 240, FEB (2014), s. 76-85. ISSN 0257-8972
R&D Projects: GA ČR GAP108/12/1941; GA TA ČR TA03010743
Institutional support: RVO:68378271
Keywords : SiCN films * annealing * temperature stability * mechanical properties * structure
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 1.998, year: 2014

Amorphous SiCxNy films (of 2.2–2.7 μm) were deposited on Si(111) substrates by reactive DC magnetron sputtering. The SiC target with small excess of carbon was sputtered at various nitrogen/argon gas flow ratios (0–0.48).The as-deposited films were additionally annealed at temperatures of 700, 900 and 1100 °C in the air during 30 min and at 900 °C in vacuum during 1 h. The depth profile of hardness and elastic modulus (nanoindentation), change of the film thickness, film composition and structure (Raman and Infrared spectroscopy) were investigated in dependence on annealing temperature and content of nitrogen. The hardness of the as-deposited films decreases with the growth of nitrogen/argon flow ratio.Air annealing at 1100 °C leads to intensive surface oxidation and formation of graphite-like structure in carbon clusters of inner layers.
Permanent Link: http://hdl.handle.net/11104/0232860