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Reactive ion etching of polystyrene microspheres
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SYSNO ASEP 0425611 Document Type K - Proceedings Paper (Czech conf.) R&D Document Type Conference Paper Title Reactive ion etching of polystyrene microspheres Author(s) Domonkos, Mária (FZU-D) RID
Ižák, Tibor (FZU-D) RID
Štolcová, L. (CZ)
Proška, J. (CZ)
Kromka, Alexander (FZU-D) RID, ORCID, SAISource Title Nanomateriály a nanotechnologie ve stavebnictví 2013. - Praha : ČVUT, 2013 / Nežerka V. ; Rácová Z. ; Ryparová P. ; Tesárek P. - ISBN 978-80-01-05334-8
S. 24-28Number of pages 5 s. Publication form Online - E Action Nanomateriály a nanotechnologie ve stavebnictví 2013 Event date 12.06.2013-12.06.2013 VEvent location Praha Country CZ - Czech Republic Event type CST Language eng - English Country CZ - Czech Republic Keywords nanosphere lithography ; reactive ion etching ; polystyrene microspheres ; Langmuir-Blodgett monolayers Subject RIV BL - Plasma and Gas Discharge Physics R&D Projects GBP108/12/G108 GA ČR - Czech Science Foundation (CSF) Institutional support FZU-D - RVO:68378271 Annotation This article gives a brief insight also into the principle of the nanosphere lithography and various plasma systems focusing on their properties and applicability for a subsequent topographical modification of surfaces prepared by NS lithography. In the experimental part of this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres is used as the primary template. The polystyrene microspheres (PM) were processed in capacitively coupled radiofrequency plasma (CCP) RIE system. The influence of process conditions on the PM geometry is systematically studied by scanning electron microscopy. The process conditions are controlled by varying radiofrequency power, total pressure, composition of the gas mixture (ratio O2:CF4) and process duration. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2014
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