Comparison of the growth of ultrathin silver film by pulsed laser deposition and magnetron sputtering

0390533 - FZÚ 2013 RIV FR eng A - Abstract
Novotný, Michal - Bulíř, Jiří - Fitl, Přemysl - Lančok, Ján - Fekete, Ladislav - Piksová, K. - Čekada, M.
Comparison of the growth of ultrathin silver film by pulsed laser deposition and magnetron sputtering.
E-MRS 2012 Spring Meeting, Symposium V Laser materials processing for micro and nano applications. Strasbourg: European Materials Research Society, 2012 - (Dusastre, V.)
[E-MRS 2012 Spring Meeting. 14.05.2012-18.05.2012, Strasbourg]
R&D Projects: GA ČR(CZ) GAP108/11/0958; GA MŠMT(CZ) MEB091125
Institutional research plan: CEZ:AV0Z10100522
Keywords : pulsed laser deposition * ultrathin silver film * magnetron sputtering * in-situ monitoring
Subject RIV: BH - Optics, Masers, Lasers

Silver thin films exhibit unusual properties and performances due to unique electrical and optical properties of silver. The films attract attention in eg. photonics, electronics, sensors and biophysics. Particular application requires the film of special morphology, ie. isolated nanoparticles, arrays, or smooth surface. It is important to choose proper deposition technique and understand mechanism of silver nucleation and growth to better control the film properties. Hence, we investigate and compare the growth of ultrathin silver film by pulsed laser deposition (PLD) and magnetron sputtering techniques. A silver target was ablated by a Nd:YAG laser operating at wavelength of 266 nm and pulse length of 4 ns in case of PLD. Silver RF magnetron sputtering was performed at power varied from 30 to 100 W. Both experiments were carried out in argon atmosphere of pressure varied from 0.5 to 3 Pa. We focus on in-situ monitoring of electrical and optical properties of the growing layer.
Permanent Link: http://hdl.handle.net/11104/0219411