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Investigation of multilayer X-ray optics for 6 keV to 20 keV energy range

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    SYSNO ASEP0380741
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleInvestigation of multilayer X-ray optics for 6 keV to 20 keV energy range
    Author(s) Oberta, Peter (FZU-D) RID, ORCID
    Platonov, Y. (US)
    Flechsig, U. (CH)
    Number of authors3
    Source TitleJournal of Synchrotron Radiation. - : Oxford Blackwell - ISSN 0909-0495
    Roč. 19, č. 5 (2012), s. 675-681
    Number of pages7 s.
    Languageeng - English
    CountryDK - Denmark
    KeywordsX-ray optics ; multilayer ; energy resolution
    Subject RIVBH - Optics, Masers, Lasers
    CEZAV0Z10100522 - FZU-D (2005-2011)
    UT WOS000307700100002
    DOI10.1107/S0909049512032153
    AnnotationThe X-ray optics group at the SLS (Swiss Light Source) in co-operation with RIT (Rigaku Innovative Technologies) has investigated seven different multilayer samples. The goal was to find an ideal multilayer structure for the energy range between 6 keV - 20 keV in terms of energy resolution and reflectivity. Such multilayer structures deposited on substrates can be used as X-ray monochromators or reflecting synchrotron mirrors. The measured reflectivities agree with the simulated ones. They are covering a reflectivity range from 45% - 80% for energies between 6 keV - 10 keV and 80% - 90% for energies between 10 keV - 20 keV. The experimentally measured energy resolution of the samples lies between 0.3% - 3.5%.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2013
Number of the records: 1  

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