Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges

Number of the records: 1

1.

SYSNO	0373839
Title	Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges
Author(s)	Straňák, V. (DE) Wulff, H. (DE) Bogdanowicz, R. (DE) Drache, S. (DE) Hubička, Zdeněk (FZU-D)_{RID, ORCID, SAI} Čada, Martin (FZU-D)_{RID, ORCID, SAI} Tichý, M. (CZ) Hippler, R. (DE)
Source Title	European Physical Journal D. Roč. 64, 2-3 (2011), 427-435. - : Springer
Document Type	Článek v odborném periodiku
Grant	GAP205/11/0386 GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic
	GP202/09/P159 GA ČR - Czech Science Foundation (CSF)
	KAN301370701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
	1M06002 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic
	M100100915 , CZ - Czech Republic
CEZ	AV0Z10100522 - FZU-D (2005-2011)
Language	eng
Country	DE
Keywords	dual magnetron * Ti-Cu film * HiPIMS * diagnostics * ion energy
Permanent Link	http://hdl.handle.net/11104/0206899

Number of the records: 1