Number of the records: 1
Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges
- 1.Straňák, V. - Wulff, H. - Bogdanowicz, R. - Drache, S. - Hubička, Zdeněk - Čada, Martin - Tichý, M. - Hippler, R.
Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges.
European Physical Journal D. Roč. 64, 2-3 (2011), 427-435. ISSN 1434-6060. E-ISSN 1434-6079
Impact factor: 1.476, year: 2011
http://hdl.handle.net/11104/0206899
Number of the records: 1