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Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges
- 1.Straňák, V., Wulff, H., Bogdanowicz, R., Drache, S., Hubička, Z., Čada, M., Tichý, M., Hippler, R. Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges. European Physical Journal D. 2011, 64(2-3), 427-435. ISSN 1434-6060. E-ISSN 1434-6079. Available: doi: 10.1140/epjd/e2011-20393-7
Number of the records: 1