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Dielectric response and structure of amorphous hydrogenated carbon films with nitrogen admixture
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SYSNO ASEP 0365579 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Dielectric response and structure of amorphous hydrogenated carbon films with nitrogen admixture Author(s) Zajíčková, L. (CZ)
Franta, D. (CZ)
Nečas, D. (CZ)
Bursíková, V. (CZ)
Muresan, M. (CZ)
Peřina, Vratislav (UJF-V) RIDNumber of authors 6 Source Title Thin Solid Films. - : Elsevier - ISSN 0040-6090
Roč. 519, č. 13 (2011), s. 4299-4308Number of pages 10 s. Language eng - English Country CH - Switzerland Keywords DENSITY-OF-STATES ; DIAMOND-LIKE CARBON ; INFRARED-SPECTRA Subject RIV BF - Elementary Particles and High Energy Physics R&D Projects GA202/07/1669 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z10480505 - UJF-V (2005-2011) UT WOS 000290187100030 DOI https://doi.org/10.1016/j.tsf.2011.02.021 Annotation The optical properties and structure of a-C:H films were modified by addition of nitrogen into the CH(4)/H(2) deposition mixture. Three films prepared in capacitively coupled rf discharge were compared: (a) hydrogenated diamond like carbon film with hydrogen content of 34% and indentation hardness of 21.7 GPa, (b) hard a-C:H:N film with nitrogen content of 13% and indentation hardness of 18.5 GPa and (c) soft a-C:H:N film with nitrogen content of 10% and indentation hardness of 6.7 GPa. It is shown how the parametrized density of states model describing dielectric response of electronic interband transitions can be applied to modified a-C:H:N and how it can be combined with correct treatment of transmittance measured in infrared range using additional Gaussian peaks in joint density of phonon states. Workplace Nuclear Physics Institute Contact Markéta Sommerová, sommerova@ujf.cas.cz, Tel.: 266 173 228 Year of Publishing 2012
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