Novel high frequency pulsed MW-linear antenna plasma-chemistry: Routes towards large area, low pressure nanodiamond growth

0361471 - FZÚ 2012 RIV CH eng J - Journal Article
Taylor, Andrew - Fendrych, František - Fekete, Ladislav - Vlček, J. - Řezáčová, V. - Petrák, V. - Krucký, J. - Nesladek, M. - Liehr, M.
Novel high frequency pulsed MW-linear antenna plasma-chemistry: Routes towards large area, low pressure nanodiamond growth.
Diamond and Related Materials. Roč. 20, č. 4 (2011), s. 613-615. ISSN 0925-9635. E-ISSN 1879-0062
R&D Projects: GA AV ČR KAN200100801; GA AV ČR(CZ) KAN400480701; GA MŠMT(CZ) LD11076
EU Projects: European Commission(XE) 238201 - MATCON
Institutional research plan: CEZ:AV0Z10100520
Keywords : nanodiamond * high frequency * microwave plasma enhanced CVD * OES * Raman
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 1.913, year: 2011

Current experimental microwave plasma enhanced chemical vapour deposition (MW PECVD) concepts for diamond thin films do not allow scaling up toward large areas, which is essential for microelectronic industries. Also, current growth temperatures are rather high and not compatible with processing technologies. In the current work we demonstrate a breakthrough concept using a high frequency (HF) pulsed MW-linear antenna plasma configuration, allowing a scalable concept. By using HF pulses non-linear MW absorption conditions are reached, allowing a reduction of input power to 4 W/cm2 compared with typically 100-200 W/cm2 for resonance cavity applicators. Despite the factor of 50 power reduction, the growth rate obtained at 450°C is comparable to or higher than that of resonance cavity systems. Our concept is a significant improvement as compared to [1 & 3] previous methods of nanodiamond growth. The resulting diamond films show columnar growth, i.e. resembling classical NCD.
Permanent Link: http://hdl.handle.net/11104/0198778