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Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 μs and 500 μs
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SYSNO ASEP 0359582 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 μs and 500 μs Author(s) Straňák, V. (DE)
Drache, S. (DE)
Čada, Martin (FZU-D) RID, ORCID, SAI
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Tichý, M. (CZ)
Hippler, R. (DE)Source Title Contributions to Plasma Physics. - : Wiley - ISSN 0863-1042
Roč. 51, 2-3 (2011), s. 237-245Number of pages 9 s. Language eng - English Country DE - Germany Keywords time-resolved plasma diagnostics ; optical emission spectroscopy ; Langmuir probe ; magnetron sputtering Subject RIV BH - Optics, Masers, Lasers R&D Projects KAN301370701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) GP202/09/P159 GA ČR - Czech Science Foundation (CSF) KJB100100805 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) 1M06002 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GA202/09/0800 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z10100522 - FZU-D (2005-2011) UT WOS 000288610800020 DOI 10.1002/ctpp.201000065 Annotation Time-resolved measurements have been performed during dual High Power Impulse Magnetron Sputtering (dual-HiPIMS) with two cathodes in a closed magnetic field configuration. The effect of a delay between subsequent pulses on electron density, mean electron energy, and ion flux to the substrate was investigated by time-resolved diagnostic methods. Two different delays of 15 μs and 500 μs between subsequent pulses were investigated. The dual-HiPIMS system, operated at a repetition frequency f = 100 Hz and duty cycle of 1 %, was equipped with different metallic targets (Ti, Cu). It is shown that a delay between subsequent pulses influences the plasma parameters and can be used to control deposition processes. It was noted that target surfaces (alternately serving as a cathode/anode) are contaminated by sputtered material from the previous pulse which influences the time-evolution of the discharge parameters. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2012
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