Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources

Sobierajski, R.; Bruijn, S.; Khorsand, A.R.; Louis, E.; van de Kruijs, R.W.E.; Burian, Tomáš; Chalupský, Jaromír; Cihelka, Jaroslav; Gleeson, A.; Grzonka, J.; Gullikson, E.M.; Hájková, Věra; Hau-Riege, S.; Juha, Libor; Jurek, M.; Klinger, D.; Krzywinski, J.; London, R.; Pelka, J. B.; Płociński, T.; Rasiński, M.; Tiedtke, K.; Toleikis, S.; Vyšín, Luděk; Wabnitz, H.; Bijkerk, F.

doi:https://dx.doi.org/10.1364/OE.19.000193

Number of the records: 1

Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources

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SYSNO ASEP	0359322
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources
Author(s)	Sobierajski, R. (PL) Bruijn, S. (NL) Khorsand, A.R. (NL) Louis, E. (NL) van de Kruijs, R.W.E. (NL) Burian, Tomáš (FZU-D)_{RID, ORCID} Chalupský, Jaromír (FZU-D)_{RID, ORCID} Cihelka, Jaroslav (FZU-D) Gleeson, A. (GB) Grzonka, J. (PL) Gullikson, E.M. (US) Hájková, Věra (FZU-D)_{RID, ORCID} Hau-Riege, S. (US) Juha, Libor (FZU-D)_{RID, ORCID, SAI} Jurek, M. (PL) Klinger, D. (PL) Krzywinski, J. (US) London, R. (US) Pelka, J. B. (PL) Płociński, T. (PL) Rasiński, M. (PL) Tiedtke, K. (DE) Toleikis, S. (DE) Vyšín, Luděk (FZU-D)_{RID, ORCID} Wabnitz, H. (DE) Bijkerk, F. (NL)
Source Title	Optics Express. - : Optical Society of America - ISSN 1094-4087 Roč. 19, č. 1 (2011), s. 193-205
Number of pages	13 s.
Language	eng - English
Country	US - United States
Keywords	laser damage ; thermal effects ; multilayers ; optical design and fabrication ; free-electron lasers
Subject RIV	BH - Optics, Masers, Lasers
R&D Projects	KAN300100801 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
	LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	LC528 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	LA08024 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	IAA400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
CEZ	AV0Z10100523 - FZU-D (2005-2011)
UT WOS	000285915300031
DOI	10.1364/OE.19.000193
Annotation	We investigated the damage mechanism of MoN/SiN multilayer XUV optics under two extreme conditions: thermal annealing and irradiation with single shot intense XUV pulses from the free-electron laser facility in Hamburg - FLASH. The damage was studied "post-mortem" by means of X-ray diffraction, interference-polarizing optical microscopy, atomic force microscopy, and scanning transmission electron microscopy. Although the timescale of the damage processes and the damage threshold temperatures were different (in the case of annealing it was the dissociation temperature of Mo2N and in the case of XUV irradiation it was the melting temperature of MoN) the main damage mechanism is very similar: molecular dissociation and the formation of N-2, leading to bubbles inside the multilayer structure.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2012

Number of the records: 1