Number of the records: 1
Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system
- 1.Virostko, Petr - Hubička, Zdeněk - Čada, Martin - Tichý, M.
Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system.
Journal of Physics D-Applied Physics. Roč. 43, č. 12 (2010), s. 1-7. ISSN 0022-3727. E-ISSN 1361-6463
Impact factor: 2.105, year: 2010
http://stacks.iop.org/JPhysD/43/124019
http://hdl.handle.net/11104/0196554
Number of the records: 1