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Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system
- 1.0358552 - FZÚ 2012 RIV GB eng J - Journal Article
Virostko, Petr - Hubička, Zdeněk - Čada, Martin - Tichý, M.
Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system.
Journal of Physics D-Applied Physics. Roč. 43, č. 12 (2010), s. 1-7. ISSN 0022-3727. E-ISSN 1361-6463
R&D Projects: GA AV ČR KAN301370701; GA ČR GP202/09/P159; GA ČR GA202/09/0800
Grant - others:AVČR(CZ) M100100915
Institutional research plan: CEZ:AV0Z10100522
Keywords : plasma * pulsed DC * ion flux * hollow cathode
Subject RIV: BL - Plasma and Gas Discharge Physics
Impact factor: 2.105, year: 2010
http://stacks.iop.org/JPhysD/43/124019
Permanent Link: http://hdl.handle.net/11104/0196554
Number of the records: 1