Number of the records: 1  

RF discharge generation of I atoms in CH.sub.3./sub.I and CF.sub.3./sub.I for COIL/DOIL

  1. 1.
    SYSNO ASEP0353965
    Document TypeC - Proceedings Paper (int. conf.)
    R&D Document TypeConference Paper
    TitleRF discharge generation of I atoms in CH3I and CF3I for COIL/DOIL
    Author(s) Schmiedberger, Josef (FZU-D) RID
    Jirásek, Vít (FZU-D) RID
    Čenský, Miroslav (FZU-D) RID
    Picková, Irena (FZU-D)
    Kodymová, Jarmila (FZU-D) RID
    Number of authors5
    Source TitleGas Flow, Chemical Lasers, and High-Power Lasers. - Bellingham : SPIE, 2009 / Vitar R. ; Conde O. ; Fajardo M. ; Silva L. O. ; Pires M. ; Utkin A. - ISSN 0277-786X - ISBN 9780819473653
    Pages71310e/1-71310e/8
    Number of pages8 s.
    ActionInternational Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers /17./
    Event date15.09.2008-19.09.2008
    VEvent locationLisboa
    CountryPT - Portugal
    Event typeWRD
    Languageeng - English
    CountryUS - United States
    KeywordsCOIL ; DOIL ; atomic iodine generation ; RF discharge ; CF3I ; CH3I
    Subject RIVBH - Optics, Masers, Lasers
    CEZAV0Z10100523 - FZU-D (2005-2011)
    AnnotationA cw/pulsed RF discharge coupled by electrodes in coaxial arrangement is used to dissociate iodine atoms from CH3I or CF3I molecules diluted in a carrier gas (a mixture of Ar and He). The discharge chamber is arranged directly inside an iodine injector of laser to minimize the recombination of generated atomic iodine before its injection into the supersonic flow in laser cavity. Measurements of I atoms concentration are done by means of absorption measurements at the wavelength of 1315 nm in dependence on basic RF discharge parameters and flow mixing conditions.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2011
Number of the records: 1  

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