Examination of Very Thin Free-standing Films with Slow Electrons

Number of the records: 1

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SYSNO ASEP	0352509
Document Type	C - Proceedings Paper (int. conf.)
R&D Document Type	Conference Paper
Title	Examination of Very Thin Free-standing Films with Slow Electrons
Author(s)	Müllerová, Ilona (UPT-D)_{RID, SAI, ORCID} Hovorka, Miloš (UPT-D) Frank, Luděk (UPT-D)_{RID, SAI, ORCID}
Number of authors	3
Source Title	Proceedings of 5th Japan-China-Norway Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology. - Toyama : University of Toyama, 2010 - ISBN 978-4-9903248-2-7
Pages	s. 45-48
Number of pages	4 s.
Action	JCNCS2010 /5./ Japan-China-Norway Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology
Event date	12.09.2010-15.09.2010
VEvent location	Toyama
Country	JP - Japan
Event type	WRD
Language	eng - English
Country	JP - Japan
Keywords	very low energy STEM ; penetration of very slow electrons ; graphene
Subject RIV	JA - Electronics ; Optoelectronics, Electrical Engineering
R&D Projects	IAA100650902 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
	ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
CEZ	AV0Z20650511 - UPT-D (2005-2011)
Annotation	Free-standing films of thicknesses in units of nm have been examined using both reflected and transmitted electrons in the scanning low energy electron microscope.
Workplace	Institute of Scientific Instruments
Contact	Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178
Year of Publishing	2011

Number of the records: 1