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Laser interferometric measuring system for positioning in nanometrology
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SYSNO ASEP 0351325 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Ostatní články Title Laser interferometric measuring system for positioning in nanometrology Author(s) Lazar, Josef (UPT-D) RID, ORCID, SAI
Číp, Ondřej (UPT-D) RID, SAI, ORCID
Čížek, Martin (UPT-D) RID, ORCID, SAI
Hrabina, Jan (UPT-D) RID, ORCID, SAI
Šerý, Mojmír (UPT-D) RID, SAINumber of authors 5 Source Title WSEAS Transactions on Circuits and Systems - ISSN 1109-2734
Roč. 9, č. 10 (2010), s. 660-669Number of pages 10 s. Language eng - English Country GR - Greece Keywords Interferometry ; local probe microscopy ; nanometrology ; nanopositioning ; traceability Subject RIV BH - Optics, Masers, Lasers R&D Projects LC06007 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) KAN311610701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) FR-TI1/241 GA MPO - Ministry of Industry and Trade (MPO) GA102/09/1276 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z20650511 - UPT-D (2005-2011) Annotation In this contribution we present a development of a system for dimensional nanometrology based on scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of sample profile combined with interferometer controlled positioning. The key goal for introduction of interferometer measurement is not only improvement of resolution but the direct traceability to the primary etalon of length. Interferometry compared to a host of other optical length measuring techniques [1,2,3...] represents the most precise measuring technique available. The system is being developed to operate at and in cooperation with the Czech metrology institute for calibration purposes and nanometrology. Workplace Institute of Scientific Instruments Contact Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178 Year of Publishing 2011
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