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Physical and photocatalytic properties of laser fabricated crystalline TiO.sub.2./sub. at low temperatures
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SYSNO ASEP 0349017 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Physical and photocatalytic properties of laser fabricated crystalline TiO2 at low temperatures Author(s) Remsa, Jan (FZU-D) RID, ORCID
Jelínek, M. (CZ)
Kocourek, T. (CZ)
Mikšovský, J. (CZ)
Studnička, Václav (FZU-D) RID
Vorlíček, Vladimír (FZU-D) RID
Sváta, V. (CZ)
Vymětalová, V. (CZ)Source Title Journal of Optoelectronics and Advanced Materials. - : NATL INST OPTOELECTRONICS - ISSN 1454-4164
Roč. 12, č. 3 (2010), s. 754-757Number of pages 4 s. Language eng - English Country RO - Romania Keywords pulsed laser deposition ; TiO2 ; contact angle ; photocatalytic properties ; thin films Subject RIV BM - Solid Matter Physics ; Magnetism CEZ AV0Z10100522 - FZU-D (2005-2011) UT WOS 000277827900068 EID SCOPUS 77950650406 Annotation We report on an extensive study of the deposition of titanium dioxide layers by pulsed laser deposition at either room temperature or at 200°C (300°C, 400°C, 500°C) from pure titanium and titanium dioxide targets. Some amorphous samples were annealed by the rapid thermal annealing method. The study is focused on the effect of variation of pressure of the reactive oxygen and the inert argon atmospheres, and the mixtures of both. The laser fluency varied in the range 2 J/cm2 to 9 J/cm2. The crystalline structure was characterized by X-ray diffraction and Raman Spectroscopy and for the study of the surface properties, atomic force microscopy was used. The TiO2 photocatalytic characteristics were determined using 4-chlorphenol solution degradation evaluated by pH measurement. Polycrystalline (anatase, rutile, and brookite) and amorphous layers exhibiting photocatalytic behavior were obtained at low substrate temperatures (200°C). Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2012
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