Raman mapping of microcrystalline silicon thin films with high spatial resolution

0347763 - FZÚ 2011 RIV DE eng J - Journal Article
Ledinský, Martin - Vetushka, Aliaksi - Stuchlík, Jiří - Fejfar, Antonín - Kočka, Jan
Raman mapping of microcrystalline silicon thin films with high spatial resolution.
Physica Status Solidi C. Roč. 7, 3-4 (2010), s. 704-707. ISSN 1862-6351
R&D Projects: GA MŠMT(CZ) LC06040; GA AV ČR KAN400100701; GA MŠMT LC510; GA AV ČR(CZ) IAA100100902
Institutional research plan: CEZ:AV0Z10100521
Keywords : Raman * atomic force microscopy * microcrystalline silicon
Subject RIV: BM - Solid Matter Physics ; Magnetism
http://www3.interscience.wiley.com/journal/123277609/abstract

Raman maps, i.e., grids of individual spectra of Raman scattering from excitation laser beam focused by optical microscope, were used to characterize mixed phase silicon thin films. Raman maps measured with 442 nm and 785 nm lasers were compared with topography or local current maps recorded by conductive atomic force microscope (C-AFM) in the same field of view. The Raman measurement may irreversibly influence the thin film surface by thermal oxidation, as proved by the change of local conductivity observed in C-AFM. Resolution limit of individual grains in Raman mapping with 442 nm excitation was 350 nm, however, we were able to detect much smaller individual grains (down to 160 nm diameter measured by AFM) if they were isolated in amorphous matrix. Polarized Raman spectroscopy is able to detect the crystallographic orientation of the single microcrystalline grain. Resolution of the Raman mapping may be significantly improved by tip enhanced Raman measurement.
Permanent Link: http://hdl.handle.net/11104/0188466