IR Laser CVD of Nanostructured Si/Ge Alloy from Silane-Germane Mixture

Number of the records: 1

1.

SYSNO ASEP	0346363
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	IR Laser CVD of Nanostructured Si/Ge Alloy from Silane-Germane Mixture
Author(s)	Křenek, Tomáš (UCHP-M) Murafa, Nataliya (UACH-T)_{RID, SAI} Bezdička, Petr (UACH-T)_{SAI, RID, ORCID} Šubrt, Jan (UACH-T)_{SAI, RID} Pola, Josef (UCHP-M)_{RID, ORCID, SAI}
Source Title	Journal of Analytical and Applied Pyrolysis. - : Elsevier - ISSN 0165-2370 Roč. 89, č. 1 (2010), s. 137-141
Number of pages	5 s.
Language	eng - English
Country	NL - Netherlands
Keywords	silane ; germane ; ir laser
Subject RIV	CF - Physical ; Theoretical Chemistry
R&D Projects	LC523 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
CEZ	AV0Z40720504 - UCHP-M (2005-2011)
	AV0Z40320502 - UACH-T (2005-2011)
UT WOS	000281930300020
DOI	10.1016/j.jaap.2010.07.003
Annotation	IR laser-irradiation of an equimolar silane-germane mixture in Ar results in the decomposition of both compounds and allows chemical vapour deposition (CVD) of solid metastable and nanostructured Si/Ge film.
Workplace	Institute of Chemical Process Fundamentals
Contact	Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227
Year of Publishing	2011

Number of the records: 1