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Laser-induced Dielectric Breakdown in Tetramethylgermane/tetramethyltin Mixtures: Deposition of Nanostructured Sn/Ge/C and Ge-Sn/C Films

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    0342845 - ÚCHP 2011 RIV GB eng J - Journal Article
    Křenek, Tomáš - Murafa, Nataliya - Bezdička, Petr - Šubrt, Jan - Pola, Josef
    Laser-induced Dielectric Breakdown in Tetramethylgermane/tetramethyltin Mixtures: Deposition of Nanostructured Sn/Ge/C and Ge-Sn/C Films.
    Applied Organometallic Chemistry. Roč. 24, č. 6 (2010), s. 458-463. ISSN 0268-2605. E-ISSN 1099-0739
    R&D Projects: GA MŠMT LC523
    Institutional research plan: CEZ:AV0Z40720504; CEZ:AV0Z40320502
    Keywords : IC laser * dielectric breakdown * tetramethylgermane
    Subject RIV: CA - Inorganic Chemistry
    Impact factor: 2.062, year: 2010

    TEA CO2 laser-irradiation of gaseous tetramethylgermane (TMG) - tetramethyltin (TMT) mixtures in Ar results in decomposition of both organometallic compounds and in chemical vapour deposition of nanostructured films of Ge-Sn/C alloy.
    Permanent Link: http://hdl.handle.net/11104/0185465

     
     
Number of the records: 1  

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