Interaction of intense ultrashort XUV pulses with silicon

Sobierajski, R.; Klinger, D.; Jurek, M.; Pelka, J. B.; Juha, Libor; Chalupský, Jaromír; Cihelka, Jaroslav; Hájková, Věra; Vyšín, Luděk; Jastrow, U.; Stojanovic, N.; Toleikis, S.; Wabnitz, H.; Krzywinski, J.; Hau-Riege, S.; London, R.

Number of the records: 1

Interaction of intense ultrashort XUV pulses with silicon

1.

SYSNO ASEP	0335956
Document Type	C - Proceedings Paper (int. conf.)
R&D Document Type	Conference Paper
Title	Interaction of intense ultrashort XUV pulses with silicon
Title	Interakce intenzivních ultra-krátkých XUV pulzů s křemíkem
Author(s)	Sobierajski, R. (PL) Klinger, D. (PL) Jurek, M. (PL) Pelka, J. B. (PL) Juha, Libor (FZU-D)_{RID, ORCID, SAI} Chalupský, Jaromír (FZU-D)_{RID, ORCID} Cihelka, Jaroslav (FZU-D) Hájková, Věra (FZU-D)_{RID, ORCID} Vyšín, Luděk (FZU-D)_{RID, ORCID} Jastrow, U. (DE) Stojanovic, N. (DE) Toleikis, S. (DE) Wabnitz, H. (DE) Krzywinski, J. (US) Hau-Riege, S. (US) London, R. (US)
Source Title	Damage to VUV, EUV, and X-ray Optics II. - Bellingham : SPIE, 2009 / Juha L. ; Bajt S. ; Sobierajski R. - ISSN 0277-786x - ISBN 9780819476357
Pages	736107/1-736107/11
Number of pages	11 s.
Action	Damage to VUV, EUV, and X-Ray Optics II
Event date	21.04.2009-23.04.2009
VEvent location	Prague
Country	CZ - Czech Republic
Event type	WRD
Language	eng - English
Country	US - United States
Keywords	radiation damage ; amorphization ; ablation ; monocrystalline silicon ; soft x-ray free-electron laser
Subject RIV	BH - Optics, Masers, Lasers
R&D Projects	KAN300100702 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
	LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	LC528 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	LA08024 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	IAA400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
CEZ	AV0Z10100523 - FZU-D (2005-2011)
Annotation	Single shot radiation damage of bulk silicon induced by ultrashort XUV pulses was studied. The sample was chosen because it is broadly used in XUV optics and detectors where radiation damage is a key issue. It was irradiated at FLASH facility in Hamburg, which provides intense femtosecond pulses at 32.5 nm wavelength. The permanent structural modifications of the surfaces exposed to single shots were characterized by means of phase contrast optical microscopy and atomic force microscopy. Mechanisms of different, intensity dependent stages of the surface damage are described.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2010

Number of the records: 1