0335956 - FZÚ 2010 RIV US eng C - Conference Paper (international conference)
Sobierajski, R. - Klinger, D. - Jurek, M. - Pelka, J. B. - Juha, Libor - Chalupský, Jaromír - Cihelka, Jaroslav - Hájková, Věra - Vyšín, Luděk - Jastrow, U. - Stojanovic, N. - Toleikis, S. - Wabnitz, H. - Krzywinski, J. - Hau-Riege, S. - London, R.
Interaction of intense ultrashort XUV pulses with silicon.
[Interakce intenzivních ultra-krátkých XUV pulzů s křemíkem.]
Damage to VUV, EUV, and X-ray Optics II. Bellingham: SPIE, 2009 - (Juha, L.; Bajt, S.; Sobierajski, R.), 736107/1-736107/11. Proceedings of SPIE, 7361. ISBN 9780819476357. ISSN 0277-786x.
[Damage to VUV, EUV, and X-Ray Optics II. Prague (CZ), 21.04.2009-23.04.2009]
R&D Projects: GA AV ČR KAN300100702; GA MŠMT LC510; GA MŠMT(CZ) LC528; GA MŠMT LA08024; GA AV ČR IAA400100701
Institutional research plan: CEZ:AV0Z10100523
Keywords : radiation damage * amorphization * ablation * monocrystalline silicon * soft x-ray free-electron laser
Subject RIV: BH - Optics, Masers, Lasers
Result website:
http://dx.doi.org/10.1117/12.822152
Permanent Link: http://hdl.handle.net/11104/0180297