Number of the records: 1  

Interaction of intense ultrashort XUV pulses with silicon

  1. 1.
    SOBIERAJSKI, R., KLINGER, D., JUREK, M., PELKA, J. B., JUHA, L., CHALUPSKÝ, J., CIHELKA, J., HÁJKOVÁ, V., VYŠÍN, L., JASTROW, U., STOJANOVIC, N., TOLEIKIS, S., WABNITZ, H., KRZYWINSKI, J., HAU-RIEGE, S., LONDON, R. Interaction of intense ultrashort XUV pulses with silicon. In: JUHA, L., BAJT, S., SOBIERAJSKI, R., eds. Damage to VUV, EUV, and X-ray Optics II. Bellingham: SPIE, 2009, 736107/1-736107/11. Proceedings of SPIE, 7361. ISBN 9780819476357. ISSN 0277-786x. Available: http://dx.doi.org/10.1117/12.822152
Number of the records: 1  

  This site uses cookies to make them easier to browse. Learn more about how we use cookies.