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SiC.sub.x./sub. layers prepared by hybrid laser deposition and PLD
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SYSNO ASEP 0335778 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title SiCx layers prepared by hybrid laser deposition and PLD Title Vrstvy SiCx připravené hybridní a pulsní laserovou deposicí Author(s) Jelínek, Miroslav (FZU-D) RID, ORCID
Kocourek, Tomáš (FZU-D) RID, ORCID, SAI
Zemek, Josef (FZU-D) RID, ORCID
Kadlec, J. (CZ)Number of authors 4 Source Title Plasma Processes and Polymers. - : Wiley - ISSN 1612-8850
Roč. 6, S1 (2009), s. 5366-5369Number of pages 4 s. Language eng - English Country DE - Germany Keywords SiC ; composites ; hybrid deposition ; puls laser deposition ; magnetron Subject RIV BM - Solid Matter Physics ; Magnetism CEZ AV0Z10100521 - FZU-D (2005-2011) UT WOS 000272302900074 DOI 10.1002/ppap.200930803 Annotation Thin SiCx films were fabricated using hybrid laser-magnetron deposition system and pulsed laser deposition (PLD). Film topology, crystallinity, composition and chemical bonds were studied. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2010
Number of the records: 1