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Measurement of total energy flux density at a substrate during TiO.sub.x./sub. thin film deposition by using a plasma jet system
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SYSNO 0334316 Title Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system Author(s) Čada, Martin (FZU-D) RID, ORCID, SAI
Virostko, Petr (FZU-D)
Kment, Štěpán (FZU-D) RID, ORCID
Hubička, Zdeněk (FZU-D) RID, ORCID, SAISource Title Vacuum. Roč. 83, č. 4 (2009), s. 738-744. - : Elsevier Document Type Článek v odborném periodiku Grant KJB100100707 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) KAN301370701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) CEZ AV0Z10100522 - FZU-D (2005-2011) Language eng Country GB Keywords hollow cathode * plasma jet * sputtering * pulsed DC * energy influx on substrate * TiO2 URL http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TW4-4SJ2WRT-2&_user=625012&_rdoc=1&_fmt=&_orig=search&_sort=d&view=c&_acct=C000031722&_vers Permanent Link http://hdl.handle.net/11104/0179088
Number of the records: 1