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Microscopic study of the H.sub.2./sub.O vapor treatment of the silicon grain boundaries
- 1.Honda, S., Mates, T., Rezek, B., Fejfar, A., Kočka, J. Microscopic study of the H2O vapor treatment of the silicon grain boundaries. Journal of Non-Crystalline Solids. 2008, 354(19-25), 2310-2313. ISSN 0022-3093. E-ISSN 1873-4812. Available: https://doi.org/10.1016/j.jnoncrysol.2007.09.107
Number of the records: 1